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==== Examples ==== | ==== Examples ==== | ||
+ | '''Nvidia Pascal P100:''' | ||
+ | * [[16 nm]] SoC chip + 4 [[HBM2]] (16 GB) | ||
+ | * 1200 mm² [[interposer]] | ||
+ | * 300 W TDP | ||
+ | * 150B transistors (15.3B SoC) | ||
+ | |||
+ | |||
<div> | <div> | ||
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<div style="float: left;">[[File:nvidia p100.png|200px]]</div> | <div style="float: left;">[[File:nvidia p100.png|200px]]</div> | ||
<div style="float: left;">[[File:nvidia pascal p100.jpg|700px]]</div> | <div style="float: left;">[[File:nvidia pascal p100.jpg|700px]]</div> | ||
</div> | </div> |
Revision as of 22:39, 16 January 2019
Packaging | |
Technologies | |
Concepts | |
Single-Row | |
Dual-Row | |
Quad-Row | |
Grid Array | |
2.5D IC | |
3D IC | |
Chip-on-Wafer-on-Substrate (CoWoS) is a two-point-five dimensional integrated circuit (2.5D IC) through-silicon via (TSV) interposer-based packaging technology designed by TSMC.
Overview
CoWoS is a wafer-level multi-chip packaging technology that incorporates multiple chiplets side-by-side on a silicon interposer in order to achieve better interconnect density and performance. The chiplets are bonded through micro-bumps on a silicon interposer forming a chip-on-wafer (CoW). The CoW is then subsequently thinned such that the TSV perforations are exposed. This is followed C4 bumps formation and singulation. A CoWoS package is completed thrugh bonding to a package substrate.
Versions
TSMC has introduced a number of versions since they first introduced the technology in 2012.
CoWoS-1
First-generation CoWoS were primarily used for large FPGAs. CoWoS-1 had an interposer die area of up to ~800 mm², very close to reticle limit
CoWoS-2
Second-generation of CoWoS increased the interposer size considerably through mask stitching. Originally qualified for 1200 mm², TSMC has since increased the interposer size to 1,700 mm². Those large packages are referred to as CoWoS-XL2.
Examples
Nvidia Pascal P100:
- 16 nm SoC chip + 4 HBM2 (16 GB)
- 1200 mm² interposer
- 300 W TDP
- 150B transistors (15.3B SoC)