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==== Examples ====
 
==== Examples ====
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'''Nvidia Pascal P100:'''
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* [[16 nm]] SoC chip + 4 [[HBM2]] (16 GB)
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* 1200 mm²  [[interposer]]
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* 300 W TDP
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* 150B transistors (15.3B SoC)
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'''Nvidia Pascal P100:'''
 
 
<div style="float: left;">[[File:nvidia p100.png|200px]]</div>
 
<div style="float: left;">[[File:nvidia p100.png|200px]]</div>
 
<div style="float: left;">[[File:nvidia pascal p100.jpg|700px]]</div>
 
<div style="float: left;">[[File:nvidia pascal p100.jpg|700px]]</div>
 
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Revision as of 22:39, 16 January 2019

v · d · e
Packaging
wc 3d stack.svg
Technologies
Concepts
Single-Row
Dual-Row
Quad-Row
Grid Array
2.5D IC
3D IC

Chip-on-Wafer-on-Substrate (CoWoS) is a two-point-five dimensional integrated circuit (2.5D IC) through-silicon via (TSV) interposer-based packaging technology designed by TSMC.

Overview

CoWoS is a wafer-level multi-chip packaging technology that incorporates multiple chiplets side-by-side on a silicon interposer in order to achieve better interconnect density and performance. The chiplets are bonded through micro-bumps on a silicon interposer forming a chip-on-wafer (CoW). The CoW is then subsequently thinned such that the TSV perforations are exposed. This is followed C4 bumps formation and singulation. A CoWoS package is completed thrugh bonding to a package substrate.

Versions

TSMC has introduced a number of versions since they first introduced the technology in 2012.

CoWoS-1

First-generation CoWoS were primarily used for large FPGAs. CoWoS-1 had an interposer die area of up to ~800 mm², very close to reticle limit

CoWoS-2

Second-generation of CoWoS increased the interposer size considerably through mask stitching. Originally qualified for 1200 mm², TSMC has since increased the interposer size to 1,700 mm². Those large packages are referred to as CoWoS-XL2.

Examples

Nvidia Pascal P100:


nvidia p100.png
nvidia pascal p100.jpg