Semiconductor & Computer Engineering
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== History == | == History == | ||
| − | ASML has been developing the technologies required to bring [[extreme ultraviolet lithography]] machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems. | + | ASML has been developing the technologies required to bring [[extreme ultraviolet lithography]] machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W at) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems. |
== Series == | == Series == | ||
=== NXE:3100 === | === NXE:3100 === | ||
| − | ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at | + | ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at 10 mJ/cm²) of throughput. In total, six 3100 machines were shipped. |
=== NXE:3300B === | === NXE:3300B === | ||
| − | In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at | + | In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at 15 mJ/cm²). |
=== NXE:3400B === | === NXE:3400B === | ||
Revision as of 22:51, 19 July 2019
NXE is a series of extreme ultraviolet lithography machines developed by ASML.
History
ASML has been developing the technologies required to bring extreme ultraviolet lithography machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W at) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems.
Series
NXE:3100
ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at 10 mJ/cm²) of throughput. In total, six 3100 machines were shipped.
NXE:3300B
In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at 15 mJ/cm²).
NXE:3400B
In 2017, ASML stated shipping their 3400B machines intended for high-volume manufacturing. Those were capable of 7 nm and 5 nm lines and spaces. The 3400B machines had an initial source power of 200 W which was later upgradable to 250 W and in the future over 300 W, allowing for a throughput of up to 175 WPH (at 20 mJ/cm²).
NXE:3400C
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