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| − | {{intel title|Nehalem|arch}}
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| − | {{microarchitecture
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| − | | atype = CPU
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| − | | name = Nehalem
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| − | | designer = Intel
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| − | | manufacturer = Intel
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| − | | introduction = August, 2008
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| − | | phase-out = March, 2010
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| − | | process = 45 nm
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| | | | |
| − | | succession = Yes
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| − | | predecessor = Penryn
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| − | | predecessor link = intel/microarchitectures/penryn
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| − | | successor = Westmere
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| − | | successor link = intel/microarchitectures/westmere
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| − | }}
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| − | '''Nehalem''' was the [[microarchitecture]] for [[Intel]]'s [[45 nm process]] for desktops and servers as a successor to {{\\|Penryn}}. Nehalem is named after the [[wikipedia:Nehalem River|Nehalem River]]. Nehalem was replaced by the {{\\|Westmere}} microarchitecture in 2010.
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| − | [[File:Nehalem.jpg|right|thumb|300px|Nehalem wafer]]
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| − |
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| − | == Process Technology ==
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| − | {| class="wikitable" style="float: right;"
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| − | ! colspan="2" | 45 nm Manufacturing Fabs
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| − | |-
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| − | ! Fab !! Location
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| − | |-
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| − | | D1D || Hillsboro, Oregon
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| − | |-
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| − | | Fab 32 || Chandler, Arizona
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| − | |-
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| − | | Fab 28 || Kiryat Gat, Israel
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| − | |}
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| − | Penryn-based [[microprocessors]] were manufactured on a [[45 nm process]]. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.
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| − |
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| − | Scaling:
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| − |
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| − | {| class="wikitable"
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| − | |-
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| − | ! !! Core !! Nehalem !! Δ !! rowspan="7" | [[File:intel 45nm gate.png|250px]]
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| − | |-
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| − | | || [[65 nm]] || [[45 nm]] ||
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| − | |-
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| − | | Metal Layers || 8 || 9 ||
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| − | |-
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| − | | Gate Pitch || 220 nm || 180 nm || 0.82x
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| − | |-
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| − | | Interconnect Pitch || 210 nm || 160 nm || 0.76x
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| − | |-
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| − | | SRAM bit cell (HD) || 0.570 µm² || 0.346 um² || 0.61x
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| − | |-
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| − | | SRAM bit cell (LP) || 0.680 µm² || 0.382 um² || 0.56x
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| − | |}
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| − |
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| − | == Die Shot ==
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| − |
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| − | ===Bloomfield===
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| − | * 263 mm²
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| − | * 713,000,000 transistors
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| − | * [[45 nm process]]
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| − | * 4 cores
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| − |
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| − | : [[File:nehalem die shot.png|700px]]
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| − |
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| − |
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| − | ===Lynfield===
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| − | * 296 mm²
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| − | * 774,000,000 transistors
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| − | * [[45 nm process]]
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| − | * 4 cores
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| − |
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| − | : [[File:intel nehalem lynfield die shot.jpg|700px]]
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| − |
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| − |
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| − | ===Nehalem-EX===
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| − | * 648 mm²
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| − | * 2.300,000,000 transistors
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| − | * [[45 nm process]]
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| − | * 8 cores
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| − |
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| − | : [[File:intel Nehalem-EX die shot.jpeg|700px]]
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