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== History ==
 
== History ==
−
ASML has been developing the technologies required to bring [[extreme ultraviolet lithography]] machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems.
+
ASML has been developing the technologies required to bring [[extreme ultraviolet lithography]] machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W at) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems.
  
 
== Series ==
 
== Series ==
 
=== NXE:3100 ===
 
=== NXE:3100 ===
−
ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at 20 mJ/cm²) of throughput. In total, six 3100 machines were shipped.
+
ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at 10 mJ/cm²) of throughput. In total, six 3100 machines were shipped.
  
 
=== NXE:3300B ===
 
=== NXE:3300B ===
−
In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at 20 mJ/cm²).
+
NXE:3300B are ASML's 3rd-generation EUV systems. In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at 15 mJ/cm²).
 +
 
 +
{| class="wikitable"
 +
|-
 +
! colspan="6" | EUV Total Systems Shipment
 +
|-
 +
! !! Q1 !! Q2 !! Q3 !! Q4 !! Total
 +
|-
 +
| 2013 || 0 || 0 || 1 || 2 || 3 NXE:3300B
 +
|-
 +
| 2014 || 1 || 1 || 2 || 1 || 5 NXE:3300B
 +
|}
 +
 
 +
=== NXE:3350B ===
 +
NXE:3350B are ASML's 3rd-generation EUV systems.
 +
 
 +
{| class="wikitable"
 +
|-
 +
! colspan="6" | EUV Total Systems Shipment
 +
|-
 +
! !! Q1 !! Q2 !! Q3 !! Q4 !! Total
 +
|-
 +
| 2015 || 1 || 1 || 0 || 0 || 2 NXE:3350B
 +
|-
 +
| 2016 || 1 || 2 || 1 || 1 || 5 NXE:3350B
 +
|}
  
 
=== NXE:3400B ===
 
=== NXE:3400B ===
 
In 2017, ASML stated shipping their 3400B machines intended for [[high-volume manufacturing]]. Those were capable of 7 nm and 5 nm lines and spaces. The 3400B machines had an initial source power of 200 W which was later upgradable to 250 W and in the future over 300 W, allowing for a throughput of up to 175 WPH (at 20 mJ/cm²).
 
In 2017, ASML stated shipping their 3400B machines intended for [[high-volume manufacturing]]. Those were capable of 7 nm and 5 nm lines and spaces. The 3400B machines had an initial source power of 200 W which was later upgradable to 250 W and in the future over 300 W, allowing for a throughput of up to 175 WPH (at 20 mJ/cm²).
 +
 +
{| class="wikitable"
 +
|-
 +
! colspan="6" | EUV Total Systems Shipment
 +
|-
 +
! !! Q1 !! Q2 !! Q3 !! Q4 !! Total
 +
|-
 +
| 2017 || 0 || 3 || 3 || 4 || 10 NXE:3400B
 +
|-
 +
| 2018 || 3 || 4 || 5 || 6 || 18 NXE:3400B
 +
|-
 +
| 2019 || 4 || 7 || 4 || 2 || 17 NXE:3400B
 +
|}
  
 
=== NXE:3400C ===
 
=== NXE:3400C ===
−
{{empty section}}
+
The first shipment of 3400C machines started in the fourth quarter of 2019. Those machines introduce a number of improvements of the 3400B machines in order to improve the availability as EUV ramps for mass production.
 +
 
 +
{| class="wikitable"
 +
|-
 +
! colspan="6" | EUV Total Systems Shipment
 +
|-
 +
! !! Q1 !! Q2 !! Q3 !! Q4 !! Total
 +
|-
 +
| 2019 || 0 || 0 || 3 || 6 || 9 NXE:3400C
 +
|-
 +
| 2020 || || || || ||
 +
|}
 +
 
 +
== EUV System Deployment ==
 +
 
 +
{| class="wikitable"
 +
|-
 +
! colspan="6" | EUV Total Systems Shipment
 +
|-
 +
! !! Q1 !! Q2 !! Q3 !! Q4 !! Total
 +
|-
 +
| 2013 || 0 || 0 || 1 || 2 || 3 NXE:3300B
 +
|-
 +
| 2014 || 1 || 1 || 2 || 1 || 5 NXE:3300B
 +
|-
 +
| 2015 || 1 || 1<br>4 backlog || 0 || 0 || 2 NXE:3350B
 +
|-
 +
| 2016 || 1<br>4 orders<br>8 backlog || 2<br>4 orders<br>10 backlog || 1<br>3 orders<br>12 backlog || 1<br>6 orders<br>18 backlog || 5 NXE:3350B
 +
|-
 +
| 2017 || 0<br>3 orders<br>22 backlog || 3<br>8 orders<br>27 backlog || 3<br><br>23 backlog || 4<br>10 orders<br>28 backlog || 10 NXE:3400B<br>(12 planned)
 +
|-
 +
| 2018 || 3<br>9 orders<br>34 backlog || 4<br>1 order<br>31 backlog || 5<br>5 orders<br>31 backlog || 6<br>5 orders<br>30 backlog || 18 NXE:3400B<br>(20 planned)
 +
|-
 +
| 2019 || 4 / 0<br>3 orders<br>29 backlog || 7 / 0<br>10 orders<br>32 backlog || 4 / 3<br>23 orders<br>48 backlog || 2 / 6<br>9 orders<br>49 backlog || 17 NXE:3400B<br>9 NXE:3400C<br>(30 planned)
 +
|-
 +
| 2020 || || || || || (35 planned)
 +
|-
 +
| colspan="6" | Source: WikiChip Research
 +
|}
  
 
== See also ==  
 
== See also ==  
 
* [[EUVL]]
 
* [[EUVL]]

Latest revision as of 15:44, 22 January 2020

NXE is a series of extreme ultraviolet lithography machines developed by ASML.

History[edit]

ASML has been developing the technologies required to bring extreme ultraviolet lithography machines into mass production since the 1980s. ASML intended of putting EUV into HVM by the late 1990s. A number of breakthroughs that only took place over the last decades enabled EUV to finally reach mass production capabilities. By 2006, ASML has two alpha (2 W at) demos out EUV tools which went to imec and the other to Albany (To a research center at the University of Albany in collaboration by New York State with IBM and ASML). ASML started shipping the first generation NXE machines in 2010. By 2017 ASML started shipping the first HVM systems.

Series[edit]

NXE:3100[edit]

ASML started shipping their first NXE:3100 machines in 2010. Those tools were NA 0.25 (NA=0.25 and σ=0.81) pre-production systems capable of 19 nm lines and spaces. It had a field size of 26 x 33 mm² and a flare of less than 8%. They had a power source of 10 Watts and were capable of up to 10 WPH (at 10 mJ/cm²) of throughput. In total, six 3100 machines were shipped.

NXE:3300B[edit]

NXE:3300B are ASML's 3rd-generation EUV systems. In 2013, ASML stated shipping their first 0.33 NA machines intended for prototyping. Those were capable of 13 nm lines and spaces. They had a power source of 40 W which was later upgradable to 80 W, allowing for a throughput of up to 50 WPH (at 15 mJ/cm²).

EUV Total Systems Shipment
Q1 Q2 Q3 Q4 Total
2013 0 0 1 2 3 NXE:3300B
2014 1 1 2 1 5 NXE:3300B

NXE:3350B[edit]

NXE:3350B are ASML's 3rd-generation EUV systems.

EUV Total Systems Shipment
Q1 Q2 Q3 Q4 Total
2015 1 1 0 0 2 NXE:3350B
2016 1 2 1 1 5 NXE:3350B

NXE:3400B[edit]

In 2017, ASML stated shipping their 3400B machines intended for high-volume manufacturing. Those were capable of 7 nm and 5 nm lines and spaces. The 3400B machines had an initial source power of 200 W which was later upgradable to 250 W and in the future over 300 W, allowing for a throughput of up to 175 WPH (at 20 mJ/cm²).

EUV Total Systems Shipment
Q1 Q2 Q3 Q4 Total
2017 0 3 3 4 10 NXE:3400B
2018 3 4 5 6 18 NXE:3400B
2019 4 7 4 2 17 NXE:3400B

NXE:3400C[edit]

The first shipment of 3400C machines started in the fourth quarter of 2019. Those machines introduce a number of improvements of the 3400B machines in order to improve the availability as EUV ramps for mass production.

EUV Total Systems Shipment
Q1 Q2 Q3 Q4 Total
2019 0 0 3 6 9 NXE:3400C
2020

EUV System Deployment[edit]

EUV Total Systems Shipment
Q1 Q2 Q3 Q4 Total
2013 0 0 1 2 3 NXE:3300B
2014 1 1 2 1 5 NXE:3300B
2015 1 1
4 backlog 		0 0 2 NXE:3350B
2016 1
4 orders
8 backlog 		2
4 orders
10 backlog 		1
3 orders
12 backlog 		1
6 orders
18 backlog 		5 NXE:3350B
2017 0
3 orders
22 backlog 		3
8 orders
27 backlog 		3

23 backlog 		4
10 orders
28 backlog 		10 NXE:3400B
(12 planned)
2018 3
9 orders
34 backlog 		4
1 order
31 backlog 		5
5 orders
31 backlog 		6
5 orders
30 backlog 		18 NXE:3400B
(20 planned)
2019 4 / 0
3 orders
29 backlog 		7 / 0
10 orders
32 backlog 		4 / 3
23 orders
48 backlog 		2 / 6
9 orders
49 backlog 		17 NXE:3400B
9 NXE:3400C
(30 planned)
2020 (35 planned)
Source: WikiChip Research

See also[edit]

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