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Difference between revisions of "Template:lithography processes"

(Added some of the newer missing lithographic processes (not that it matters much at this point since they are all going to be redlinks))
(Removed redundancies: 0.25 micrometer is the same as 250nm. Changed all sub 1 micrometer lithographies to nanometer scale)
Line 14: Line 14:
 
:* [[1.5μm lithography process|1.5μm]]
 
:* [[1.5μm lithography process|1.5μm]]
 
:* [[1μm lithography process|1μm]]
 
:* [[1μm lithography process|1μm]]
−
:* [[0.8μm lithography process|0.8μm]]
+
:* [[800nm lithography process|800nm]]
−
:* [[0.6μm lithography process|0.6μm]]
+
:* [[600nm lithography process|600nm]]
−
:* [[0.5μm lithography process|0.5μm]]
+
:* [[500nm lithography process|500nm]]
−
:* [[0.35μm lithography process|0.35μm]]
 
−
:* [[0.25μm lithography process|0.25μm]]
 
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:* [[0.22μm lithography process|0.22μm]]
 
 
:* [[350nm lithography process|350nm]]
 
:* [[350nm lithography process|350nm]]
 
:* [[250nm lithography process|250nm]]
 
:* [[250nm lithography process|250nm]]

Revision as of 12:59, 28 March 2016

Semiconductor lithography processes technology

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