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{{lithography processes}} | {{lithography processes}} | ||
− | The '''10 µm lithography process''' was the [[semiconductor process]] technology used by the major semiconductor companies during the years of 1967 and 1973 | + | The '''10 µm lithography process''' was the [[semiconductor process]] technology used by the major semiconductor companies during the years of 1967 and 1973. The typical [[wafer]] size for this process at companies such as [[Fairchild]] and [[TI]] were 1.5 inch (38 mm). |
== Industry == | == Industry == | ||
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{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
− | ! [[Intel]] !! [[TI]] !! [[RCA]] !! [[Fairchild | + | ! [[Intel]] !! [[TI]] !! [[RCA]] !! [[Fairchild]] |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | | + | | || || || |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | 1970 || 1969 || 1969 || | + | | 1970 || 1969 || 1969 || |
|- | |- | ||
− | | ? nm || ? nm || ? nm | + | | ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
− | | ? nm || ? nm || ? nm | + | | ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
− | | 2 || 2 || 2 || 2 | + | | 2 || 2 || 2 || 2 |
|- | |- | ||
− | | PMOS || PMOS | + | | PMOS || PMOS || PMOS || PMOS |
|- | |- | ||
− | | 51 mm | + | | 51 mm || || || |
{{scrolling table/end}} | {{scrolling table/end}} | ||
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** {{intel|MCS-40|4040}} | ** {{intel|MCS-40|4040}} | ||
** {{intel|MCS-8|8008}} | ** {{intel|MCS-8|8008}} | ||
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{{expand list}} | {{expand list}} | ||
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| searchlabel=Click to browse all 10 µm models | | searchlabel=Click to browse all 10 µm models | ||
}} | }} | ||
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== 10 µm Chips == | == 10 µm Chips == | ||
* Intel | * Intel | ||
** {{intel|3000}} | ** {{intel|3000}} | ||
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{{expand list}} | {{expand list}} | ||
{{stub}} | {{stub}} | ||
− | [[ | + | [[Category:Lithography]] |