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{{lithography processes}} | {{lithography processes}} | ||
− | The ''' | + | The '''150 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[180 nm lithography process|180 nm]] and [[130 nm lithography process|130 nm]] processes. Commercial [[integrated circuit]] manufacturing using 55 nm process began in early 2000s. This technology superseded by commercial [[130 nm]], [[110 nm]], and [[90 nm]] processes. |
== Industry == | == Industry == | ||
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{{scrolling table/top|style=text-align: right; | first=Fab | {{scrolling table/top|style=text-align: right; | first=Fab | ||
|Process Name | |Process Name | ||
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{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
− | ! colspan="2" | [[TSMC]] !! colspan="2" | [[Fujitsu | + | ! colspan="2" | [[TSMC]] !! colspan="2" | [[Fujitsu]] |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | colspan="2" | || colspan="2" | CS-85 | + | | colspan="2" | || colspan="2" | CS-85 |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | colspan="2" | 2000 | + | | colspan="2" | 2000 || colspan="2" | 2002 |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | colspan="2" | || colspan="2" | 6 | + | | colspan="2" | || colspan="2" | 6 |
|- | |- | ||
− | + | ! Value !! [[180 nm]] Δ !! Value !! [[180 nm]] Δ | |
|- | |- | ||
− | + | | ? nm || ?x || ? nm || ?x | |
|- | |- | ||
− | + | | ? nm || ?x || ? nm || ?x | |
|- | |- | ||
− | | 3.42 µm<sup>2</sup> || 0.74x | + | | 3.42 µm<sup>2</sup> || 0.74x || ? µm<sup>2</sup> || ?x |
{{scrolling table/end}} | {{scrolling table/end}} | ||
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** {{hal|SPARC64 GP}} | ** {{hal|SPARC64 GP}} | ||
{{expand list}} | {{expand list}} | ||
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