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From WikiChip
					
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-  ...), source (S) and drain (D) terminals. The gate is separated from the body by an [[gate oxide|insulating layer]] (pink).]] ...is a type of insulated-gate [[field-effect transistor]] that is fabricated by the [[thermal oxidation|controlled oxidation]] of a [[semiconductor]] (typi193 KB (26,852 words) - 18:51, 11 March 2025
 -  ...uding {{intel|Core i3|i3}}, {{intel|Core i5|i5}}, and {{intel|Core i7|i7}} models. * February 8: Intel announced a $7B investment in Fab 42 which will be used to manufacture chip8 KB (999 words) - 10:04, 3 January 2019
 
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