From WikiChip
Editing technology node
Warning: You are not logged in. Your IP address will be publicly visible if you make any edits. If you log in or create an account, your edits will be attributed to your username, along with other benefits.
The edit can be undone.
Please check the comparison below to verify that this is what you want to do, and then save the changes below to finish undoing the edit.
This page supports semantic in-text annotations (e.g. "[[Is specified as::World Heritage Site]]") to build structured and queryable content provided by Semantic MediaWiki. For a comprehensive description on how to use annotations or the #ask parser function, please have a look at the getting started, in-text annotation, or inline queries help pages.
Latest revision | Your text | ||
Line 4: | Line 4: | ||
Since around 2017 node names have been entirely overtaken by marketing with some leading-edge foundries using node names ambiguously to represent slightly modified processes. Additionally, the size, density, and performance of the transistors among foundries no longer matches between foundries. For example, Intel's [[10 nm]] is comparable to foundries [[7 nm]] while Intel's [[7 nm]] is comparable to foundries [[5 nm]]. | Since around 2017 node names have been entirely overtaken by marketing with some leading-edge foundries using node names ambiguously to represent slightly modified processes. Additionally, the size, density, and performance of the transistors among foundries no longer matches between foundries. For example, Intel's [[10 nm]] is comparable to foundries [[7 nm]] while Intel's [[7 nm]] is comparable to foundries [[5 nm]]. | ||
− | == | + | == Naming == |
The driving force behind process node scaling is [[Moore's Law]]. To achieve density doubling, the [[contacted poly pitch]] (CPP) and the [[minimum metal pitch]] (MMP) need to scale by roughly 0.7x each node. In other words, a scaling of <code>0.7x CPP ⋅ 0.7x MMP ≈ ½ area</code>. The node names are effectively a self-fulfilling prophecy driven by [[Moore's Law]]. | The driving force behind process node scaling is [[Moore's Law]]. To achieve density doubling, the [[contacted poly pitch]] (CPP) and the [[minimum metal pitch]] (MMP) need to scale by roughly 0.7x each node. In other words, a scaling of <code>0.7x CPP ⋅ 0.7x MMP ≈ ½ area</code>. The node names are effectively a self-fulfilling prophecy driven by [[Moore's Law]]. | ||