From WikiChip
Editing Template:lithography processes

Warning: You are not logged in. Your IP address will be publicly visible if you make any edits. If you log in or create an account, your edits will be attributed to your username, along with other benefits.

The edit can be undone. Please check the comparison below to verify that this is what you want to do, and then save the changes below to finish undoing the edit.

This page is not enabled for semantic in-text annotations due to namespace restrictions. Details about how to enable the namespace can be found on the configuration help page.

Latest revision Your text
Line 1: Line 1:
 
<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
{| cellspacing="0"
 
{| cellspacing="0"
−
| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | [[File:basic wafer drawing.svg|link=|75px|class=wikichip_ogimage]] Semiconductor lithography processes technology
+
| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" |
 +
Semiconductor lithography processes technology
 
|-
 
|-
 
| style="padding-left: 10px;" |
 
| style="padding-left: 10px;" |
−
:* [[1 nm lithography process|1 nm]]
+
:* [[50 µm lithography process|50 µm]]
−
:* [[2 nm lithography process|2 nm]]
+
:* [[20 µm lithography process|20 µm]]
−
:* [[3 nm lithography process|3 nm]]
+
:* [[20 µm lithography process|16 µm]]
 +
:* [[10 µm lithography process|10 µm]]
 +
:* [[8 µm lithography process|8 µm]]
 +
:* [[6 µm lithography process|6 µm]]
 +
:* [[5 µm lithography process|5 µm]]
 +
:* [[3.5 µm lithography process|3.5 µm]]
 +
:* [[3 µm lithography process|3 µm]]
 +
:* [[2 µm lithography process|2 µm]]
 +
:* [[1.5 µm lithography process|1.5 µm]]
 +
:* [[1 µm lithography process|1 µm]]
 +
:* [[800 nm lithography process|800 nm]]
 +
:* [[600 nm lithography process|600 nm]]
 +
:* [[500 nm lithography process|500 nm]]
 +
:* [[350 nm lithography process|350 nm]]
 +
:* [[250 nm lithography process|250 nm]]
 +
:* [[220 nm lithography process|220 nm]]
 +
:* [[180 nm lithography process|180 nm]]
 +
:* [[150 nm lithography process|150 nm]]
 +
:* [[130 nm lithography process|130 nm]]
 +
:* [[110 nm lithography process|110 nm]]
 +
:* [[90 nm lithography process|90 nm]]
 +
:* [[80 nm lithography process|80 nm]]
 +
:* [[65 nm lithography process|65 nm]]
 +
:* [[45 nm lithography process|45 nm]]
 +
:* [[40 nm lithography process|40 nm]]
 +
:* [[32 nm lithography process|32 nm]]
 +
:* [[28 nm lithography process|28 nm]]
 +
:* [[22 nm lithography process|22 nm]]
 +
:* [[14 nm lithography process|14 nm]]
 +
:* [[10 nm lithography process|10 nm]]
 +
:* [[7 nm lithography process|7 nm]]
 
:* [[5 nm lithography process|5 nm]]
 
:* [[5 nm lithography process|5 nm]]
−
:* [[7 nm lithography process|7 nm]]
+
|}
−
:* [[10 nm lithography process|10 nm]]
+
{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}}
−
:* [[14 nm lithography process|14 nm]]
 
−
:* [[16 nm lithography process|16 nm]]
 
−
:* [[20 nm lithography process|20 nm]]
 
−
:* [[22 nm lithography process|22 nm]]
 
−
:* [[28 nm lithography process|28 nm]]
 
−
:* [[32 nm lithography process|32 nm]]
 
−
:* [[40 nm lithography process|40 nm]]
 
−
:* [[45 nm lithography process|45 nm]]
 
−
:* [[55 nm lithography process|55 nm]]
 
−
:* [[65 nm lithography process|65 nm]]
 
−
:* [[80 nm lithography process|80 nm]]
 
−
:* [[90 nm lithography process|90 nm]]
 
−
:* [[110 nm lithography process|110 nm]]
 
−
:* [[130 nm lithography process|130 nm]]
 
−
:* [[150 nm lithography process|150 nm]]
 
−
:* [[180 nm lithography process|180 nm]]
 
−
:* [[220 nm lithography process|220 nm]]
 
−
:* [[240 nm lithography process|240 nm]]
 
−
:* [[250 nm lithography process|250 nm]]
 
−
:* [[280 nm lithography process|280 nm]]
 
−
:* [[350 nm lithography process|350 nm]]
 
−
:* [[500 nm lithography process|500 nm]]
 
−
:* [[600 nm lithography process|600 nm]]
 
−
:* [[650 nm lithography process|650 nm]]
 
−
:* [[700 nm lithography process|700 nm]]
 
−
:* [[750 nm lithography process|750 nm]]
 
−
:* [[800 nm lithography process|800 nm]]
 
−
:* [[1 µm lithography process|1 µm]]
 
−
:* [[1.2 µm lithography process|1.2 µm]]
 
−
:* [[1.3 µm lithography process|1.3 µm]]
 
−
:* [[1.5 µm lithography process|1.5 µm]]
 
−
:* [[2 µm lithography process|2 µm]]
 
−
:* [[2.5 µm lithography process|2.5 µm]]
 
−
:* [[3 µm lithography process|3 µm]]
 
−
:* [[3.5 µm lithography process|3.5 µm]]
 
−
:* [[5 µm lithography process|5 µm]]
 
−
:* [[6 µm lithography process|6 µm]]
 
−
:* [[7 µm lithography process|7 µm]]
 
−
:* [[8 µm lithography process|8 µm]]
 
−
:* [[10 µm lithography process|10 µm]]
 
−
:* [[16 µm lithography process|16 µm]]
 
−
:* [[20 µm lithography process|20 µm]]
 
−
:* [[50 µm lithography process|50 µm]]
 
−
|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 
 
</div>
 
</div>
 
<noinclude>
 
<noinclude>
 
[[Category:Lithography]]
 
[[Category:Lithography]]
 
</noinclude>
 
</noinclude>

Please note that all contributions to WikiChip may be edited, altered, or removed by other contributors. If you do not want your writing to be edited mercilessly, then do not submit it here.
You are also promising us that you wrote this yourself, or copied it from a public domain or similar free resource (see WikiChip:Copyrights for details). Do not submit copyrighted work without permission!

Cancel | Editing help (opens in new window)

Template used on this page:

Retrieved from "https://en.wikichip.org/wiki/Template:lithography_processes"