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{{lithography processes}}
 
{{lithography processes}}
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The '''90 nanometer (90 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[110 nm lithography process|110 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 90 nm process began in 2003. This technology was superseded by the [[80 nm lithography process|80 nm process]] (HN) / [[65 nm lithography process|65 nm process]] (FN) in 2006.
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The '''90 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[110 nm lithography process|110 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 90 nm process began in 2003. This technology was superseded by the [[80 nm lithography process|80 nm process]] (HN) / [[65 nm lithography process|65 nm process]] (FN) in 2006.
  
 
== Industry ==
 
== Industry ==
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Introduced in late 2002, Intel's 90 nm process became the first volume production to introduce [[strained silicon]] transistors.
 
 
{{scrolling table/top|style=text-align: right; | first=Fab
 
{{scrolling table/top|style=text-align: right; | first=Fab
 
  |Process Name
 
  |Process Name
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  |Type
 
  |Type
 
  |Wafer
 
  |Wafer
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|Metal Layers
 
 
  | 
 
  | 
 
  |Contacted Gate Pitch
 
  |Contacted Gate Pitch
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{{scrolling table/mid}}
 
{{scrolling table/mid}}
 
|-
 
|-
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! colspan="2" | [[Intel]] !! colspan="2" | [[TSMC]] !! colspan="2" | [[Samsung]] !! colspan="2" | [[Fujitsu]] || colspan="2" | [[IBM]] / [[Toshiba]] / [[Sony]] / [[AMD]] / [[Chartered]] !! colspan="2" | [[Motorola]] !! colspan="2" | [[TI]]
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! colspan="2" | [[Intel]] !! colspan="2" | [[TSMC]] !! colspan="2" | [[Samsung]] !! colspan="2" | [[Fujitsu]] || colspan="2" | [[IBM]] / [[Toshiba]] / [[Sony]] / [[AMD]] / [[Chartered]]
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="2" | P1262 || colspan="2" |  || colspan="2" |  || colspan="2" | CS-100 / CS-101 || colspan="2" |  || colspan="2" |  HiPerMOS 8 || colspan="2" |   
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| colspan="2" | P1262 || colspan="2" |  || colspan="2" |  || colspan="2" | CS-100 / CS-101 || colspan="2" |   
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="2" | 2002 || colspan="2" | 2003 || colspan="2" | 2003 || colspan="2" | 2004 || colspan="2" | 2003 || colspan="2" | 2004 || colspan="2" | 2005
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| colspan="2" | 2002 || colspan="2" | 2003 || colspan="2" | 2003 || colspan="2" | 2004 || colspan="2" | 2003
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="8" | Bulk || colspan="4" | PDSOI || colspan="2" | Bulk
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| colspan="8" | Bulk || colspan="2" | PDSOI
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="14" | 300mm
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| colspan="10" | 300mm
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|- style="text-align: center;"
 
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| colspan="2" | 7 || colspan="2" |  || colspan="2" |  || colspan="2" | 10 || colspan="2" |  || colspan="2" | || colspan="2" | 9
 
 
|-
 
|-
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! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ  
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! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ !! Value !! [[130 nm]] Δ
 
|-
 
|-
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| 260 nm || 0.82x || 240 nm || 0.77x || 245 nm || 0.70x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x  
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| 260 nm || 0.82x || 240 nm || 0.77x || 245 nm || 0.70x || ? nm || ?x || ? nm || ?x
 
|-
 
|-
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| 220 nm || 0.63x || 240 nm || 0.71x || 245 nm || 0.70x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x  
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| 220 nm || 0.63x || 240 nm || 0.71x || 245 nm || 0.70x || ? nm || ?x || ? nm || ?x
 
|-
 
|-
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| 1.0 µm² || 0.50x || 0.999 µm² || 0.47x ||  0.999 µm² || ?x || 1.07 µm² || 0.54x || 0.999 µm² || ?x || ? µm² || ?x || ? µm² || ?x  
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| 1.0 µm<sup>2</sup> || 0.50x || 0.999 µm<sup>2</sup> || 0.47x ||  0.999 µm<sup>2</sup> || ?x || 1.07 µm<sup>2</sup> || 0.54x || 0.999 µm<sup>2</sup> || ?x
 
|-
 
|-
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| || || || || 0.275 µm² || || || || 0.19 µm² || ?x || || || ||
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| || || || || || || || || 0.19 µm<sup>2</sup> || ?x
 
{{scrolling table/end}}
 
{{scrolling table/end}}
  
 
== 90 nm Microprocessors==
 
== 90 nm Microprocessors==
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* AMD
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{{expand list}}
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** {{amd|Athlon 64}}
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** {{amd|Athlon 64 X2}}
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== 90 nm System on Chips==
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** {{amd|FX}}
 
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** {{amd|Opteron}}
 
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** {{amd|Turion 64}}
 
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** {{amd|Turion 64 X2}}
 
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* Cavium
 
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** {{cavium|OCTEON Plus}}
 
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* HAL (Fujitsu)
 
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** {{hal|SPARC64 V}}
 
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* IBM
 
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** {{ibm|PowerPC 970}}
 
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* Loongson
 
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** {{loongson|Godson 2}}
 
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* Qualcomm
 
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** {{qualcomm|MSM6xxx}}
 
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* Sun
 
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** {{sun|UltraSPARC T1}}
 
 
* Intel
 
* Intel
 
** {{intel|Pentium 4 Extreme Edition}}
 
** {{intel|Pentium 4 Extreme Edition}}
 
** {{intel|Pentium M}}
 
** {{intel|Pentium M}}
 
** {{intel|Pentium D}}
 
** {{intel|Pentium D}}
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** {{intel|EP80579}}
 
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* STMicroelectronics
 
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** STM32 F4
 
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** STM32 F7
 
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** STM32 G0
 
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** STM32 G4
 
 
{{expand list}}
 
{{expand list}}
  
 
== 90 nm Microarchitectures ==
 
== 90 nm Microarchitectures ==
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* AMD
 
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** {{amd|K8|l=arch}}
 
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* ARM
 
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** {{armh|ARM7|l=arch}}
 
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* IBM
 
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** {{ibm|z9|l=arch}}
 
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* Intel
 
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** {{intel|Pentium M|l=arch}}
 
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* VIA Technologies
 
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** {{via|Esther|l=arch}}
 
 
{{expand list}}
 
{{expand list}}
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== Documents ==
 
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* [[:File:samsung foundry - 45, 65, 90 (August, 2007).pdf|Samsung foundry - 45 nm, 65 nm, 90 nm guide (August, 2007)]]
 
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[[category:lithography]]
 

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