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Editing 7 nm lithography process
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=== TSMC === | === TSMC === | ||
− | TSMC started mass production of its '''7-nanometer N7 node''' in April 2018. TSMC considers its 7-nanometer node a full node shrink over its 16-nanometer. Although TSMC has released a 10-nanometer node the year prior, the company considered its 10 nm to be a short-lived node and was intended to serve as a learning node on its way to 7. In early 2019 TSMC introduced the second version of its N7 process called '''N7P''' which provides additional performance enhancements. With the availability of | + | TSMC started mass production of its '''7-nanometer N7 node''' in April 2018. TSMC considers its 7-nanometer node a full node shrink over its 16-nanometer. Although TSMC has released a 10-nanometer node the year prior, the company considered its 10 nm to be a short-lived node and was intended to serve as a learning node on its way to 7. In early 2019 TSMC introduced the second version of its N7 process called '''N7P''' which provides additional performance enhancements. With the availability of {{asml|nxe|high-throughput EUV machines}} ready for mass production, TSMC introduced a third variant called '''N7+''' which uses EUV. |
==== N7 ==== | ==== N7 ==== |