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{{lithography processes}}
 
{{lithography processes}}
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The '''500 nanometer (500 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
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The '''500 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
  
 
== Industry ==
 
== Industry ==
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{{scrolling table/mid}}
 
{{scrolling table/mid}}
 
|-
 
|-
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! colspan="2" | [[Intel]] || colspan="2" | [[AMD]] || colspan="2" | [[DEC]] || colspan="2" | [[Fujitsu]] || colspan="2" | [[Hitachi]] || colspan="2" | [[HP]] || colspan="2" | [[IBM]] || colspan="2" | [[TI]] || colspan="2" | [[Motorola]] || colspan="2" | [[National Semiconductor|National]] (BiCMOS)
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! colspan="2" | [[Intel]] || colspan="2" | [[AMD]] || colspan="2" | [[DEC]] || colspan="2" | [[Fujitsu]] || colspan="2" | [[Hitachi]] || colspan="2" | [[HP]] || colspan="2" | [[IBM]] || colspan="2" | [[TI]]
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="2" |P852 || colspan="2" | CS-24 || colspan="2" | CMOS-5 || colspan="2" | || colspan="2" | || colspan="2" | CMOS14C || colspan="2" | CMOS-5X || colspan="2" | || colspan="2" | HiPerMOS 1 || colspan="2" | ABiC V
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| colspan="2" |P852 || colspan="2" | || colspan="2" | CMOS-5 || colspan="2" | || colspan="2" | || colspan="2" | CMOS14C || colspan="2" | CMOS-5X || colspan="2" |  
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="2" | 1994 || colspan="2" | 1993 || colspan="2" | 1993 || colspan="2" | 1994 || colspan="2" | 1994 || colspan="2" | 1996 || colspan="2" | 1994 || colspan="2" | 1995 || colspan="2" | 1995 || colspan="2" |
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| colspan="2" | 1994 || colspan="2" | 1993 || colspan="2" | 1993 || colspan="2" | 1994 || colspan="2" | 1994 || colspan="2" | 1996 || colspan="2" | 1994 || colspan="2" | 1995
 
|- style="text-align: center;"
 
|- style="text-align: center;"
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| colspan="2" |  || colspan="2" | 3 || colspan="2" | 4 || colspan="2" | 3 || colspan="2" | 4 || colspan="2" | 5 || colspan="2" | 4 || colspan="2" | 4 || colspan="2" |  || colspan="2" |
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| colspan="2" |  || colspan="2" | 3 || colspan="2" | 4 || colspan="2" | 3 || colspan="2" | 4 || colspan="2" | 5 || colspan="2" | 4 || colspan="2" | 4
 
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|-
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! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ
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! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ !! Value !! [[800 nm]] Δ
 
|-
 
|-
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| ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x
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| ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x
 
|-
 
|-
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| ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x
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| ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x || ? nm || ?x
 
|-
 
|-
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| 44 µm² || 0.40x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x || ? µm² || ?x
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| 44 µm<sup>2</sup> || 0.40x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x
 
{{scrolling table/end}}
 
{{scrolling table/end}}
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=== DEC ===
 
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{{see also|dec/process|l1=DEC's Process Technology History}}
 
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DEC's half-micron process, '''CMOS-5''', which was used for their microprocessors such as the {{decc|Alpha 21164|l=arch}} used a Cabalt di-silicide in diffusion and poly with a channel length of 0.365 µm with a T<sub>OX</sub> of 9 nm along with 4 metal layers of AlCu (Aluminum Copper). The process had a Vtn/p = 0.5/-0.5 V and a supply voltage of 3.3 V.
 
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{| class="wikitable collapsible collapsed"
 
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|-
 
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! colspan="3" | DEC's Design Rules
 
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|-
 
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! Layer !! Pitch !! Thickness
 
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|-
 
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| M1 || 1.50 µm || 0.84 µm
 
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|-
 
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| M2 || 1.75 µm || 0.84 µm
 
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|-
 
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| M3 || 5.00 µm || 1.53 µm
 
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|-
 
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| M4 || 6.00 µm || 1.53 µm
 
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|}
 
  
 
== 500 nm Microprocessors ==
 
== 500 nm Microprocessors ==
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* Sun
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** {{sun|microSPARC II}}, 1994
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** {{sun|UltraSPARC}}
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* HP
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** {{hp|PA-7200}} ("Thunderbird")
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** {{hp|PA-7300LC}}
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** {{hp|PA-8000}} ("Onyx", "Vulcan")
 
* AMD
 
* AMD
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** {{amd|Am486}}
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** {{amd|80486}}
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** {{amd|K5}} ("SSA/5" models only)
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** {{amd|K5}}
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* Cyrix
 
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** {{cyrix|6x86}}
 
 
* DEC
 
* DEC
 
** {{decc|Alpha 21164}}
 
** {{decc|Alpha 21164}}
 
** {{decc|Alpha 21064A}}
 
** {{decc|Alpha 21064A}}
 
** {{decc|Alpha 21164PC}}
 
** {{decc|Alpha 21164PC}}
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* Exponential
 
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** {{expotech|X704}}
 
 
* Fujitsu
 
* Fujitsu
 
** {{fujitsu|microSPARC II}} ("Swift")
 
** {{fujitsu|microSPARC II}} ("Swift")
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* Ross
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** {{ross|hyperSPARC}} ("Colorado 2")
 
* Hitachi
 
* Hitachi
 
** {{hitachi|harp-1}}
 
** {{hitachi|harp-1}}
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* HP
 
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** {{hp|PA-7200}} ("Thunderbird")
 
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** {{hp|PA-7300LC}}
 
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** {{hp|PA-8000}} ("Onyx", "Vulcan")
 
 
* IBM
 
* IBM
 
** {{ibm|PowerPC 601v}}
 
** {{ibm|PowerPC 601v}}
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** {{ibm|PowerPC 603}}
 
** {{ibm|PowerPC 603}}
 
** {{ibm|PowerPC 603e}}
 
** {{ibm|PowerPC 603e}}
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* NexGen
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** {{nexgen|Nx586}}
 
* Intel
 
* Intel
 
** {{intel|Pentium Pro}}
 
** {{intel|Pentium Pro}}
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* NexGen
 
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** {{nexgen|Nx586}}
 
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* Qualcomm
 
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** {{qualcomm|MSM2}}
 
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* Ross
 
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** {{ross|hyperSPARC}} ("Colorado 2")
 
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* Sun
 
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** {{sun|microSPARC II}}, 1994
 
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** {{sun|UltraSPARC}}
 
 
{{expand list}}
 
{{expand list}}
  
 
== 500 nm Microarchitectures ==
 
== 500 nm Microarchitectures ==
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* AMD
 
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** {{amd|K5|l=arch}}
 
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* DEC
 
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** {{decc|Alpha 21164|l=arch}}
 
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* Intel
 
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** {{intel|80186|l=arch}} (embedded [[IP cores]] only)
 
 
{{expand list}}
 
{{expand list}}
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[[category:lithography]]
 

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