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Template:finfet nodes comp
Revision as of 02:45, 5 April 2017 by Inject (talk | contribs) (Inject moved page Template:10 nm comp to Template:finfet nodes comp)

 
Process Name
1st Production
Lithography Lithography
Immersion
Exposure
Wafer Type
Size
Transistor Type
Voltage
 
Fin Pitch
Width
Height
Gate Length (Lg)
Contacted Gate Pitch (CPP)
Minimum Metal Pitch (MMP)
SRAM bitcell High-Perf (HP)
High-Density (HD)
Low-Voltage (LV)
DRAM bitcell eDRAM
Value
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