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Difference between revisions of "Template:10 nm comp header"
(Created page with "{| class="wikitable" style="float:left; margin:0; margin-right:-1px; font-family: monospace;" |- ! colspan="2" | |- ! style="text-align: right;" colspan="2" | Proce...") |
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Revision as of 23:49, 4 April 2017
| Process Name | |
|---|---|
| 1st Production | |
| Wafer | Type |
| Size | |
| Transistor | Type |
| Voltage | |
| Fin | Pitch |
| Width | |
| Height | |
| Gate Pitch (Lg) | |
| Contacted Gate Pitch (CPP) | |
| Interconnect Pitch (M1P) | |
| SRAM bitcell | High-Perf (HP) |
| High-Density (HD) | |
| Low-Voltage (LV) | |
| DRAM bitcell | eDRAM |