Semiconductor & Computer Engineering
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Information for "280 nm lithography process"
Basic information
| Display title | 280 nm lithography process |
| Default sort key | 280 nm lithography process |
| Page length (in bytes) | 1,686 |
| Page ID | 7021 |
| Page content language | English (en) |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 2 |
| Counted as a content page | Yes |
| Number of subpages of this page | 0 (0 redirects; 0 non-redirects) |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Inject (talk | contribs) |
| Date of page creation | 00:07, 27 April 2016 |
| Latest editor | Oleg3280 (talk | contribs) |
| Date of latest edit | 05:11, 20 July 2018 |
| Total number of edits | 12 |
| Total number of distinct authors | 3 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
Page properties
| Transcluded templates (14) | Templates used on this page:
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