Semiconductor & Computer Engineering
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[[File:tech node naming.svg]] | [[File:tech node naming.svg]] | ||
== History== | == History== | ||
| − | {{see also|intel | + | {{see also|intel/process|l1=Intel's Semiconductor Process History}} |
Roughly for the first 35 years of the semiconductor history, since the first mass production of [[MOSFET]] in the 1960s to the late 1990s, the process node more or less referred to the transistor's [[gate length]] (L<sub>g</sub>) which was also considered the "minimum feature size". For example, [[Intel]]'s [[0.5 µm process]] had <code>L<sub>g</sub> = 0.5 µm</code>. This lasted until the [[0.25 µm process]] in [[1997]] at which point Intel started introducing more aggressive gate length scaling. For example, their [[0.25 µm process]] had <code>L<sub>g</sub> = 0.20 µm</code> and likewise, their [[0.18 µm process]] had <code>L<sub>g</sub> = 0.13 µm</code> (a node ahead). At those nodes the "process node" was effectively larger than the gate length. | Roughly for the first 35 years of the semiconductor history, since the first mass production of [[MOSFET]] in the 1960s to the late 1990s, the process node more or less referred to the transistor's [[gate length]] (L<sub>g</sub>) which was also considered the "minimum feature size". For example, [[Intel]]'s [[0.5 µm process]] had <code>L<sub>g</sub> = 0.5 µm</code>. This lasted until the [[0.25 µm process]] in [[1997]] at which point Intel started introducing more aggressive gate length scaling. For example, their [[0.25 µm process]] had <code>L<sub>g</sub> = 0.20 µm</code> and likewise, their [[0.18 µm process]] had <code>L<sub>g</sub> = 0.13 µm</code> (a node ahead). At those nodes the "process node" was effectively larger than the gate length. | ||
