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== Terminology == | == Terminology == | ||
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Historically, a '''mask''' or '''photomask''' referred to a pattern transferring device that contained the entire pattern of a single layer of a full wafer. A '''reticle''', on the other hand, referred to a single layer of pattern that covers a small portion of the wafer. A reticle has to be stepped and repeated in order to expose the entire wafer. In other words, compared to a reticle, a mask used to refer to a pattern that could be printed in a single exposure to cover the entire wafer without any optical de-magnification. Today, the terms are often used synonymously. | Historically, a '''mask''' or '''photomask''' referred to a pattern transferring device that contained the entire pattern of a single layer of a full wafer. A '''reticle''', on the other hand, referred to a single layer of pattern that covers a small portion of the wafer. A reticle has to be stepped and repeated in order to expose the entire wafer. In other words, compared to a reticle, a mask used to refer to a pattern that could be printed in a single exposure to cover the entire wafer without any optical de-magnification. Today, the terms are often used synonymously. | ||