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− | + | [[File:Chromium photomask (details).JPG|thumb|200px|right|A detailed picture of the opaque and transparent patterns on a chromium mask.]] | |
− | A '''mask''' or '''reticle''' (sometimes '''photomask''' and '''photoreticle''') is a | + | A '''mask''' or '''reticle''' (sometimes '''photomask''' and '''photoreticle''') is a quartz plate with opaque and transparent patterns. A mask works much like a [[wikipedia:Negative (photography)|negative]] - by shining light through the mask, the detailed device image can then be projected onto the [[wafer]] (see [[photoresist]]). |
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Each individual mask contains a single pattern which when stacked together forms the common electrical elements such as [[resistors]], [[capacitors]] and [[transistors]]. An entire [[mask set]] is then fed into a [[photolithography stepper]] which cycle through the set, exposing individual masks to the [[wafers]] to form the circuitry needed. | Each individual mask contains a single pattern which when stacked together forms the common electrical elements such as [[resistors]], [[capacitors]] and [[transistors]]. An entire [[mask set]] is then fed into a [[photolithography stepper]] which cycle through the set, exposing individual masks to the [[wafers]] to form the circuitry needed. | ||
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==Manufacturing Process== | ==Manufacturing Process== | ||
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It is during that stage that the mask blank with the writing is finely inspected for quality. If any issues are observed the mask is recycled and gets re-written. If the mask passes inspection the written pattern is then etched. [[Plasma etching]] is done via a [[plasma etcher]] which sprays ions onto the mask penetration and dissolving the chromium in the exposed areas. Finally the leftover resistant is removed forming the final product - a mask with transparent and opaque patterns. | It is during that stage that the mask blank with the writing is finely inspected for quality. If any issues are observed the mask is recycled and gets re-written. If the mask passes inspection the written pattern is then etched. [[Plasma etching]] is done via a [[plasma etcher]] which sprays ions onto the mask penetration and dissolving the chromium in the exposed areas. Finally the leftover resistant is removed forming the final product - a mask with transparent and opaque patterns. | ||
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==See also== | ==See also== | ||
* [[mask count]] | * [[mask count]] | ||
* [[mask set]] | * [[mask set]] | ||
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+ | {{stub}} |