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<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;"> | <div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;"> | ||
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− | | style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | | + | | style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | |
+ | Semiconductor lithography processes technology | ||
|- | |- | ||
| style="padding-left: 10px;" | | | style="padding-left: 10px;" | | ||
− | :* [[ | + | :* [[10μm lithography process|10μm]] |
− | :* [[ | + | :* [[8μm lithography process|8μm]] |
− | :* [[ | + | :* [[6μm lithography process|6μm]] |
− | :* [[ | + | :* [[5μm lithography process|5μm]] |
− | :* [[ | + | :* [[3.5μm lithography process|3.5μm]] |
− | :* [[ | + | :* [[3μm lithography process|3μm]] |
− | :* [[ | + | :* [[2μm lithography process|2μm]] |
− | :* [[ | + | :* [[1.5μm lithography process|1.5μm]] |
− | :* [[ | + | :* [[1μm lithography process|1μm]] |
− | :* [[ | + | :* [[800nm lithography process|800nm]] |
− | :* [[ | + | :* [[600nm lithography process|600nm]] |
− | :* [[ | + | :* [[500nm lithography process|500nm]] |
− | :* [[ | + | :* [[350nm lithography process|350nm]] |
− | :* [[ | + | :* [[250nm lithography process|250nm]] |
− | :* [[ | + | :* [[220nm lithography process|220nm]] |
− | :* [[ | + | :* [[180nm lithography process|180nm]] |
− | :* [[ | + | :* [[150nm lithography process|150nm]] |
− | :* [[ | + | :* [[130nm lithography process|130nm]] |
− | :* [[ | + | :* [[110nm lithography process|110nm]] |
− | :* [[ | + | :* [[90nm lithography process|90nm]] |
− | :* [[ | + | :* [[80nm lithography process|80nm]] |
− | :* [[ | + | :* [[65nm lithography process|65nm]] |
− | :* [[ | + | :* [[45nm lithography process|45nm]] |
− | :* [[ | + | :* [[40nm lithography process|40nm]] |
− | :* [[ | + | :* [[32nm lithography process|32nm]] |
− | :* [[ | + | :* [[28nm lithography process|28nm]] |
− | :* [[ | + | :* [[22nm lithography process|22nm]] |
− | :* [[ | + | :* [[14nm lithography process|14nm]] |
− | :* [[ | + | :* [[10nm lithography process|10nm]] |
− | :* [[ | + | :* [[7nm lithography process|7nm]] |
− | :* [[ | + | :* [[5nm lithography process|5nm]] |
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</div> | </div> | ||
<noinclude> | <noinclude> | ||
[[Category:Lithography]] | [[Category:Lithography]] | ||
</noinclude> | </noinclude> |