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Editing 800 nm lithography process
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{{lithography processes}} | {{lithography processes}} | ||
− | The '''800 nanometer (800 nm) lithography process''' was a semiconductor manufacturing process used by a variety of [[integrated circuit]] manufacturers in | + | The '''800 nanometer (800 nm) lithography process''' was a semiconductor manufacturing process used by a variety of [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes. |
== Industry == | == Industry == | ||
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|Process Name | |Process Name | ||
|1st Production | |1st Production | ||
− | |||
|Metal Layers | |Metal Layers | ||
| | | | ||
− | |Gate | + | |Contacted Gate Pitch |
|Interconnect Pitch (M1P) | |Interconnect Pitch (M1P) | ||
|SRAM bit cell | |SRAM bit cell | ||
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{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
− | ! [[Intel]] (BICMOS) !! colspan="2" | [[Intel]] (CHMOS V) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]] !! [[National Semiconductor|National]] (ASIC BiCMOS) !! [[National Semiconductor|National]] (Memory BiCMOS) | + | ! [[Intel]] (BICMOS) !! colspan="2" | [[Intel]] (CHMOS V) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]] !! [[National Semiconductor|National]] (ASIC BiCMOS) !! [[National Semiconductor|National]] (Memory BiCMOS) |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | || colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G || ABiC IV || BiCMOS III | + | | || colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G || ABiC IV || BiCMOS III |
|- style="text-align: center;" | |- style="text-align: center;" | ||
− | | 1991 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1989 || 1991 || 1991 || 1991 || || 1990 || 1990 | + | | 1991 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1989 || 1991 || 1991 || 1991 || || 1990 || 1990 |
− | |||
− | |||
|- | |- | ||
− | | || colspan="2" | 3 || 2 || 2 || 2 || || 3 || 2 || 3 || || 4 | + | | || colspan="2" | 3 || 2 || 2 || 2 || || 3 || 2 || 3 || || 4 || 2 |
|- | |- | ||
− | ! Value !! Value !! [[1 µm]] Δ | + | ! Value !! Value !! [[1 µm]] Δ !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value |
|- | |- | ||
− | | ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm | + | | ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
− | | ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || 2.5 µm || 1.8 | + | | ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || 2.5 µm || 1.8 µm |
|- | |- | ||
− | | ? µm² || 111 µm² || 0.50x || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || 100 | + | | ? µm² || 111 µm² || 0.50x || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || 100 µm² || ? µm² |
{{scrolling table/end}} | {{scrolling table/end}} | ||
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** {{intel|80486|l=arch}} (later models) | ** {{intel|80486|l=arch}} (later models) | ||
** {{intel|80186|l=arch}} (embedded [[IP cores]] only) | ** {{intel|80186|l=arch}} (embedded [[IP cores]] only) | ||
− | |||
− | |||
{{expand list}} | {{expand list}} | ||
− | [[ | + | [[Category:Lithography]] |