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Editing 3 µm lithography process
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== Industry == | == Industry == | ||
− | + | {{scrolling table/top|style=text-align: right; | first=Fab | |
− | {{ | + | |Process Name |
− | + | |1st Production | |
− | + | |Voltage | |
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− | + | |Contacted Gate Pitch | |
− | + | |Interconnect Pitch (M1P) | |
− | + | |SRAM bit cell | |
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}} | }} | ||
+ | {{scrolling table/mid}} | ||
+ | |- | ||
+ | ! [[Hitachi]] | ||
+ | |- style="text-align: center;" | ||
+ | | Hi-CMOS I | ||
+ | |- style="text-align: center;" | ||
+ | | ? | ||
+ | |- | ||
+ | | 5 V | ||
+ | |- | ||
+ | ! Value | ||
+ | |- | ||
+ | | 3 µm | ||
+ | |- | ||
+ | | 3 µm | ||
+ | |- | ||
+ | | ? µm² | ||
+ | {{scrolling table/end}} | ||
== 3 μm Microprocessors == | == 3 μm Microprocessors == | ||
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== References == | == References == | ||
− | + | * Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984. | |
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− | [[ | + | [[Category:Lithography]] |