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From WikiChip
700 nm lithography process
(Redirected from 0.7 µm)
Semiconductor lithography processes technology |
|
The 700 nanometer (700 nm) lithography process is was semiconductor manufacturing process following the 1 µm process. Commercial integrated circuit manufacturing using 700 nm process began in early 1990s. 700 nm and was phased out and later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry[edit]
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
Metal Layers |
SRAM bit cell |
AMD |
---|
1993 |
? nm |
? nm |
3 |
? µm2 |
700 nm Microprocessors[edit]
- AMD
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