The 65 nm lithography process is a full node semiconductor manufacturing process following the 80 nm process stopgap. Commercial integrated circuit manufacturing using 65 nm process began in 2006. This technology was superseded by the 55 nm process (HN) / 45 nm process (FN) in 2007.

Industry

Intel

	Measurement	Scaling from 90 nm
Contacted Gate Pitch	220 nm	0.85x
Interconnect Pitch (M1P)	210 nm	0.95x
SRAM bit cell	0.570 µm2	0.61x

65 nm Microprocessors

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65 nm System on Chips

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65 nm Microarchitectures

• Intel
  • Core

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