Latest revision as of 06:21, 20 July 2018

Semiconductor lithography processes technology

1 nm 2 nm 3 nm 5 nm 7 nm 10 nm 14 nm 16 nm 20 nm 22 nm 28 nm 32 nm 40 nm 45 nm 55 nm 65 nm 80 nm 90 nm 110 nm 130 nm 150 nm 180 nm 220 nm 240 nm 250 nm 280 nm 350 nm 500 nm 600 nm 650 nm 700 nm 750 nm 800 nm 1 µm 1.2 µm 1.3 µm 1.5 µm 2 µm 2.5 µm 3 µm 3.5 µm 5 µm 6 µm 7 µm 8 µm 10 µm 16 µm 20 µm 50 µm

v · d · e

The 3.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the mid 1970s. This process had an effective channel length of roughly 3.5 µm between the source and drain. This process was later superseded by 3 µm, 2 µm, and 1.5 µm processes.

Industry[edit]

3.5 μm microcontrollers[edit]

• Intel
  • 8051
• Bell Labs
  • BELLMAC-4
• Motorola
  • 68000
  • 68010

This list is incomplete; you can help by expanding it.

This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information.