Semiconductor & Computer Engineering
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Difference between revisions of "65 nm lithography process"
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| − | The '''65 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[80 nm lithography process|80 nm process]]. Commercial [[integrated circuit]] manufacturing using 65 nm process began in 2006. This technology was superseded by the [[55 nm lithography process|55 nm process]] (HN) / [[45 nm lithography process|45 nm process]] (FN) in 2007. | + | The '''65 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[80 nm lithography process|80 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 65 nm process began in 2006. This technology was superseded by the [[55 nm lithography process|55 nm process]] (HN) / [[45 nm lithography process|45 nm process]] (FN) in 2007. |
== 65 nm Microprocessors== | == 65 nm Microprocessors== | ||
Revision as of 17:31, 15 April 2016
Semiconductor lithography processes technology
The 65 nm lithography process is a full node semiconductor manufacturing process following the 80 nm process stopgap. Commercial integrated circuit manufacturing using 65 nm process began in 2006. This technology was superseded by the 55 nm process (HN) / 45 nm process (FN) in 2007.
65 nm Microprocessors
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65 nm System on Chips
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65 nm Microarchitectures
- Intel
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