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==Manufacturing Process==
 
==Manufacturing Process==
[[File:mask process.svg|right]]
 
 
Masks are made using a '''photomask blank'''. The mask blanks are made from a finely polished [[wikipedia:fused quartz|quartz glass]] which acts as the glass substrate and [[wikipedia:Chromium|Chromium]] atoms which are deposited on top of it to create a light-shielding layer. A coat of [[photosensitive resin]] is then used to cover the surface of the mask blank. Using electron beams a circuit pattern is then written onto the mask. Depending on the technique used either the exposed or non-exposed portion of the resist gets removed.
 
Masks are made using a '''photomask blank'''. The mask blanks are made from a finely polished [[wikipedia:fused quartz|quartz glass]] which acts as the glass substrate and [[wikipedia:Chromium|Chromium]] atoms which are deposited on top of it to create a light-shielding layer. A coat of [[photosensitive resin]] is then used to cover the surface of the mask blank. Using electron beams a circuit pattern is then written onto the mask. Depending on the technique used either the exposed or non-exposed portion of the resist gets removed.
  

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