Revision as of 21:11, 23 April 2016

Semiconductor lithography processes technology

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The 90 nm lithography process is a full node semiconductor manufacturing process following the 110 nm process stopgap. Commercial integrated circuit manufacturing using 90 nm process began in 2004. This technology was superseded by the 80 nm process (HN) / 65 nm process (FN) in 2006.

Industry

Intel

• 300mm (12-inch) wafers

90 nm Microprocessors

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90 nm System on Chips

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90 nm Microarchitectures

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