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Difference between revisions of "8 µm lithography process"

(Microprocessors)
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== Microprocessors ==
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== 8 µm Microprocessors ==
 
* TI
 
* TI
 
** {{ti|TMS1000}}
 
** {{ti|TMS1000}}
 
* MOS Technology
 
* MOS Technology
 
** {{mos tech|MCS6500}}
 
** {{mos tech|MCS6500}}
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== 8 µm Chips ==
 
== 8 µm Chips ==

Revision as of 06:24, 26 April 2016

The 8 µm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1960s through the early 1970s. The typical wafer size for this process at companies such as Fairchild and TI were 2 inch (51 mm). This process was later superseded by 6 µm, 5 µm, and 3 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology
Intel TI Fairchild MOS Technology
 
1970 1969 1969 1974
 ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm
2 2 2
pMOS pMOS pMOS depletion-mode nMOS

8 µm Microprocessors

This list is incomplete; you can help by expanding it.

8 µm Chips

  • Intel
    • 1103, 1Kb DRAM, worlds first commercial DRAM


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