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800 nm lithography process
Revision as of 10:33, 25 April 2016 by David (talk | contribs) (Industry)

The 800 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BICMOS) Intel (CHMOS V) Intel (CMOS) TI (CMOS) TI (BiCMOS) Cypress AMD Motorola NEC HP HP
P650 CMOS26B CMOS26G
1991 1990 1989 1991 1991 1989 1991 1991 1991 1991
Value Value Value 1 µm Δ Value Value Value Value Value Value Value Value
 ? nm  ? nm  ? nm  ?x  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ?x  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm2  ? µm2 111 µm2 0.50x  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2

800 nm Microprocessors

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