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Difference between revisions of "800 nm lithography process"

(800 nm Microprocessors)
(Industry)
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  |Process Name
 
  |Process Name
 
  |1st Production
 
  |1st Production
| 
 
 
  |Contacted Gate Pitch
 
  |Contacted Gate Pitch
 
  |Interconnect Pitch (M1P)
 
  |Interconnect Pitch (M1P)
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{{scrolling table/mid}}
 
|-
 
|-
! [[Intel]] (BICMOS) !! [[Intel]] (CHMOS V) !! colspan="2" | [[Intel]] (CMOS) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]]
+
! [[Intel]] (BICMOS) !! [[Intel]] (CHMOS V) !! colspan="2" | [[Intel]] (CMOS) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]] !! [[National Semiconductor|National]] (BiCMOS)
 
|- style="text-align: center;"
 
|- style="text-align: center;"
| || ||  colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G
+
| || ||  colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G || ABiC IV
 
|- style="text-align: center;"
 
|- style="text-align: center;"
| 1991 || 1990 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1991 || 1991 || 1991 || 1991 ||
+
| 1991 || 1990 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1991 || 1991 || 1991 || 1991 || || 1991
 
|-
 
|-
! Value !! Value !! Value !! [[1 µm]] Δ !! Value !! Value !! Value !! Value !! Value !! Value !! Value !! Value
+
| ? nm  || ? nm || ? nm || ?x || ? nm || ? nm || ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm
 
|-
 
|-
| ? nm  || ? nm || ? nm || ?x || ? nm || ? nm || ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm
+
| ? nm  || ? nm || ? nm || ?x || ? nm || ? nm || ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm
 
|-
 
|-
| ? nm  || ? nm || ? nm || ?x || ? nm || ? nm || ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm
+
| ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  111 µm<sup>2</sup> || 0.50x ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> || ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup>
|-
 
| ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  111 µm<sup>2</sup> || 0.50x ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> || ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup>
 
 
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Revision as of 07:07, 27 April 2016

The 800 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BICMOS) Intel (CHMOS V) Intel (CMOS) TI (CMOS) TI (BiCMOS) Cypress AMD Motorola NEC HP HP National (BiCMOS)
P650 CMOS26B CMOS26G ABiC IV
1991 1990 1989 1991 1991 1989 1991 1991 1991 1991 1991
 ? nm  ? nm  ? nm  ?x  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ?x  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm2  ? µm2 111 µm2 0.50x  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2

800 nm Microprocessors

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