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Editing 800 nm lithography process

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{{lithography processes}}
 
{{lithography processes}}
The '''800 nanometer (800 nm) lithography process''' was a semiconductor manufacturing process used by a variety of [[integrated circuit]] manufacturers in the late 1980s and early 1990s. A '''"0.8 µm process"''' refers to a process which has a gate length of 0.8 µm. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
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The '''800 nanometer (800 nm) lithography process''' was a semiconductor manufacturing process used by a variety of [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
  
 
== Industry ==
 
== Industry ==

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