Semiconductor & Computer Engineering
From WikiChip
Difference between revisions of "7 µm lithography process"
(Fixed typo) |
|||
| (One intermediate revision by the same user not shown) | |||
| Line 1: | Line 1: | ||
{{Lithography processes}} | {{Lithography processes}} | ||
| − | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[ | + | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3 µm]] processes. |
== Industry == | == Industry == | ||
Latest revision as of 06:15, 18 January 2022
Semiconductor lithography processes technology
The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 5 µm, and 3 µm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch |
| Metal Layers |
| Technology |
| Wafer |
| HP |
|---|
| NMOS I |
| 1970 |
| ? nm |
| ? nm |
| nMOS |
| 51 mm |
7μm chips[edit]
 |
This section is empty; you can help add the missing info by editing this page. |
 |
This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information. |
