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Difference between revisions of "6 µm lithography process"

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! [[Intel]] !! [[Motorola]]
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! [[Intel]] !! [[Motorola]] !! [[AMI]]
 
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| 1971 || 1971
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| 1971 || 1971 ||
 
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| ? nm  || ? nm  
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| ? nm  || ? nm || ? nm  
 
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| ? nm  || ? nm
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| ? nm  || ? nm || ? nm  
 
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| 2 || 2
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| 2 || 2 ||
 
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| nMOS || depletion-mode nMOS
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| nMOS || depletion-mode nMOS || nMOS/pMOS/CMOS
 
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* Motorola
 
* Motorola
 
** {{motorola|6800}}
 
** {{motorola|6800}}
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* AMI
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** {{ami|S9900P}}
 
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Revision as of 12:12, 26 April 2016

The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
Intel Motorola AMI
 
1971 1971
 ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm
2 2
nMOS depletion-mode nMOS nMOS/pMOS/CMOS
3"

Microprocessors

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