Semiconductor & Computer Engineering
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Difference between revisions of "6 µm lithography process"
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| + | * Intel | ||
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Latest revision as of 23:04, 20 May 2018
Semiconductor lithography processes technology
The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch |
| Metal Layers |
| Technology |
| Wafer |
| Intel | Motorola | AMI | AMD |
|---|---|---|---|
| 1971 | 1971 | ||
| ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm |
| 2 | 2 | ||
| nMOS/pMOS | depletion-mode nMOS | nMOS/pMOS/CMOS | |
| 3" |
6μm Microprocessors[edit]
This list is incomplete; you can help by expanding it.
6μm Chips[edit]
- Intel
 |
This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information. |
