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Difference between revisions of "6 µm lithography process"

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{{Lithography processes}}
 
{{Lithography processes}}
The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of 1973 and 1975.
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The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes.
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== Industry ==
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{{scrolling table/top|style=text-align: right; | first=Fab
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|Process Name
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|1st Production
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|Contacted Gate Pitch
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|Interconnect Pitch
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|Metal Layers
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|Technology
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|Wafer
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}}
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{{scrolling table/mid}}
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|-
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! [[Intel]] !! [[Motorola]] !! [[AMI]] !! [[AMD]]
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|- style="text-align: center;"
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|  || || ||  
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|- style="text-align: center;"
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| 1971 || 1971 ||  ||
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|-
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| ? nm  || ? nm || ? nm || ? nm
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|-
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| ? nm  || ? nm || ? nm || ? nm
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|-
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| 2 || 2 || ||
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|-
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| nMOS/pMOS || depletion-mode nMOS || nMOS/pMOS/CMOS ||
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|-
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| 3" || || ||
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{{scrolling table/end}}
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== 6μm Microprocessors ==
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* Intel
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** {{intel|MCS-80|8080}}
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* Motorola
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** {{motorola|6800}}
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* AMI
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** {{ami|S9900P}}
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* AMD
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** {{amd|Am9080}}
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{{expand list}}
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== 6μm Chips ==
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* Intel
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** {{intel|8231}}
  
== Microprocessors ==
 
* [[Intel 8080]]
 
  
 
{{stub}}
 
{{stub}}
[[Category:Lithography]]
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[[category:lithography]]

Latest revision as of 23:04, 20 May 2018

The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.

Industry[edit]

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
Intel Motorola AMI AMD
 
1971 1971
 ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm
2 2
nMOS/pMOS depletion-mode nMOS nMOS/pMOS/CMOS
3"

6μm Microprocessors[edit]

This list is incomplete; you can help by expanding it.

6μm Chips[edit]


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