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Difference between revisions of "6 µm lithography process"

(Microprocessors)
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{{Lithography processes}}
 
{{Lithography processes}}
The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of 1973 and 1975.
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The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes.
  
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== Industry ==
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{{scrolling table/top|style=text-align: right; | first=Fab
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|Process Name
 +
|1st Production
 +
|Contacted Gate Pitch
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|Interconnect Pitch
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|Metal Layers
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|Technology
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}}
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{{scrolling table/mid}}
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|-
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! [[Intel]] !! [[Motorola]]
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|- style="text-align: center;"
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|  ||  
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|- style="text-align: center;"
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| 1971 || 1971
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|-
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| ? nm  || ? nm
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|-
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| ? nm  || ? nm
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|-
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| 2 || 2
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|-
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| nMOS || depletion-mode nMOS
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{{scrolling table/end}}
 
== Microprocessors ==
 
== Microprocessors ==
* {{intel|MCS-80|Intel 8080}}
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* Intel
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** {{intel|MCS-80|8080}}
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* Motorola
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** {{motorola|6800}}
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{{expand list}}
  
  
 
{{stub}}
 
{{stub}}
 
[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 06:24, 26 April 2016

The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology
Intel Motorola
 
1971 1971
 ? nm  ? nm
 ? nm  ? nm
2 2
nMOS depletion-mode nMOS

Microprocessors

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