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{{Lithography processes}}
 
{{Lithography processes}}
The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes.
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The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of 1973 and 1975.
 
 
== Industry ==
 
{{scrolling table/top|style=text-align: right; | first=Fab
 
|Process Name
 
|1st Production
 
|Contacted Gate Pitch
 
|Interconnect Pitch
 
|Metal Layers
 
|Technology
 
|Wafer
 
}}
 
{{scrolling table/mid}}
 
|-
 
! [[Intel]] !! [[Motorola]] !! [[AMI]] !! [[AMD]]
 
|- style="text-align: center;"
 
|  || || ||  
 
|- style="text-align: center;"
 
| 1971 || 1971 ||  ||
 
|-
 
| ? nm  || ? nm || ? nm || ? nm
 
|-
 
| ? nm  || ? nm || ? nm || ? nm
 
|-
 
| 2 || 2 || ||
 
|-
 
| nMOS/pMOS || depletion-mode nMOS || nMOS/pMOS/CMOS ||
 
|-
 
| 3" || || ||
 
{{scrolling table/end}}
 
 
 
== 6μm Microprocessors ==
 
* Intel
 
** {{intel|MCS-80|8080}}
 
* Motorola
 
** {{motorola|6800}}
 
* AMI
 
** {{ami|S9900P}}
 
* AMD
 
** {{amd|Am9080}}
 
{{expand list}}
 
 
 
== 6μm Chips ==
 
* Intel
 
** {{intel|8231}}
 
  
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== Microprocessors ==
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* [[Intel 8080]]
  
 
{{stub}}
 
{{stub}}
[[category:lithography]]
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[[Category:Lithography]]

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