Semiconductor & Computer Engineering
From WikiChip
Difference between revisions of "650 nm lithography process"
| (One intermediate revision by one other user not shown) | |||
| Line 25: | Line 25: | ||
| ? nm || ? nm || ? nm || ? nm || ? nm | | ? nm || ? nm || ? nm || ? nm || ? nm | ||
|- | |- | ||
| − | | ? | + | | ? µm² || ? µm² || ? µm² || ? µm² || ? µm² |
{{scrolling table/end}} | {{scrolling table/end}} | ||
| Line 39: | Line 39: | ||
* Ross | * Ross | ||
** {{ross|hyperSPARC}} | ** {{ross|hyperSPARC}} | ||
| + | |||
| + | [[category:lithography]] | ||
Latest revision as of 06:15, 20 July 2018
Semiconductor lithography processes technology
The 650 nanometer (650 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Cypress | IDT | TI | IBM | Motorola |
|---|---|---|---|---|
| 1992 | 1993 | 1993 | 1995 | 1995 |
| Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm² | ? µm² | ? µm² | ? µm² | ? µm² |
650 nm Microprocessors[edit]
- Cyrix
- Cx5x86-100GP, 100 MHz, July 1995
- 486 DX
- 5x86
- IBM (also made by Motorola)
- PowerPC 601, 110 MHz / 120 MHz
- Motorola
- Ross
