Semiconductor & Computer Engineering
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Difference between revisions of "600 nm lithography process"
(Created page with "{{lithography processes}} The '''600 nm lithography process''' was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 2000s. This...") |
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| − | The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early | + | The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes. |
== Industry == | == Industry == | ||
Revision as of 19:38, 24 April 2016
Semiconductor lithography processes technology
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel |
|---|
| 1994 |
| Value |
| ? nm |
| ? nm |
| ? µm2 |
600 nm Microprocessors
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600 nm Microarchitectures
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