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500 nm lithography process
Revision as of 23:35, 26 April 2016 by Inject (talk | contribs) (500 nm Microprocessors)

The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel AMD DEC Fujitsu Hitachi HP IBM TI
P852 CMOS-5 CMOS14C CMOS-5X
1994 1993 1993 1994 1994 1996 1994 1995
Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ Value 800 nm Δ
 ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x  ? nm  ?x
44 µm2 0.40x  ? µm2  ?x  ? µm2  ?x  ? µm2  ?x  ? µm2  ?x  ? µm2  ?x  ? µm2  ?x  ? µm2  ?x

500 nm Microprocessors

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500 nm Microarchitectures

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