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500 nm lithography process
Revision as of 20:58, 24 April 2016 by David (talk | contribs) (500 nm Microprocessors)

The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

500 nm Microprocessors

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500 nm Microarchitectures

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