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Difference between revisions of "500 nm lithography process"

(500 nm Microprocessors)
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{{lithography processes}}
 
{{lithography processes}}
 
The '''500 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
 
The '''500 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
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== Industry ==
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{{scrolling table/top|style=text-align: right; | first=Fab
 +
|Process Name
 +
|1st Production
 +
| 
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|Contacted Gate Pitch
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|Interconnect Pitch (M1P)
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|SRAM bit cell
 +
}}
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{{scrolling table/mid}}
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|-
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! colspan="2" | [[Intel]]
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|- style="text-align: center;"
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| colspan="2" |P852
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|- style="text-align: center;"
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| colspan="2" |1994
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|-
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! Value !! [[800 nm]] Δ
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|-
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| ? nm || ?x
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|-
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| ? nm || ?x
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|-
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| 44 µm<sup>2</sup> || 0.40x
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{{scrolling table/end}}
  
 
== 500 nm Microprocessors ==
 
== 500 nm Microprocessors ==

Revision as of 10:27, 25 April 2016

The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel
P852
1994
Value 800 nm Δ
 ? nm  ?x
 ? nm  ?x
44 µm2 0.40x

500 nm Microprocessors

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500 nm Microarchitectures

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