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Editing 500 nm lithography process

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{{lithography processes}}
 
{{lithography processes}}
The '''500 nanometer (500 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
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The '''500 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[600 nm lithography process|600 nm process]]. Commercial [[integrated circuit]] manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by [[350 nm]] in 1995.
  
 
== Industry ==
 
== Industry ==

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