From WikiChip
Difference between revisions of "45 nm lithography process"

(45 nm Microprocessors)
(45 nm Microarchitectures)
Line 16: Line 16:
 
** {{intel|Bonnell}}
 
** {{intel|Bonnell}}
 
** {{intel|Nehalem}}
 
** {{intel|Nehalem}}
 +
** {{intel|Penryn}}
  
 
{{expand list}}
 
{{expand list}}

Revision as of 17:09, 15 April 2016

The 45 nm lithography process is a full node semiconductor manufacturing process following the 65 nm process. Commercial integrated circuit manufacturing using 45 nm process began in 2007. This technology was superseded by the 40 nm process (HN) / 32 nm process (FN) in 2010.

45 nm Microprocessors

This list is incomplete; you can help by expanding it.

45 nm System on Chips

This list is incomplete; you can help by expanding it.

45 nm Microarchitectures

This list is incomplete; you can help by expanding it.