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40 nm lithography process
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The 40 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 45 nm and 32 nm processes. Commercial integrated circuit manufacturing using 40 nm process began in 2008 by leading semiconductor companies such as TSMC. This technology superseded by commercial 32 nm process by 2010.

40 nm Microprocessors

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40 nm System on Chips

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