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Difference between revisions of "40 nm lithography process"

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== Industry ==
 
== Industry ==
  
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=== Samsung ===
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{{scrolling table/top|style=text-align: right; | first=Fab
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{| class="wikitable"
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| 
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|Contacted Gate Pitch
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|Interconnect Pitch (M1P)
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|SRAM bit cell
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}}
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{{scrolling table/mid}}
 
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| || Measurement || Scaling from [[65 nm]]
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! colspan="2" | [[TSMC]] !! colspan="2" | [[Samsung]] !! colspan="2" | [[Toshiba]] / [[NEC]] !! colspan="2" | Crolles2 Alliance
 
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|-
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| Contacted Gate Pitch || 129 nm || 0.65x
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! Value !! [[65 nm]] Δ !! Value !! [[65 nm]] Δ !! Value !! [[65 nm]] Δ !! Value !! [[65 nm]] Δ
 
|-
 
|-
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| Interconnect Pitch (M1P) || 117 nm || 0.65x
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| 162 nm || ?x || 129 nm || 0.65x || 168 nm || 0.67x || 140 nm || ?x
 
|-
 
|-
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| [[SRAM]] bit cell || ? µm<sup>2</sup> || ?x
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| ? nm || ?x || 117 nm || 0.65x || ? nm || ?x || ? nm || ?x
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|}
 
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=== Toshiba / NEC ===
 
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{| class="wikitable"
 
 
|-
 
|-
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| || Measurement
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| 0.242 µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || 0.195 µm<sup>2</sup> || 0.33x || 0.250 µm<sup>2</sup> || ?x
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|-
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{{scrolling table/end}}
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| Contacted Gate Pitch || 168 nm
 
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|-
 
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| Interconnect Pitch (M1P) || ? nm
 
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|-
 
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| [[SRAM]] bit cell || 0.195 µm<sup>2</sup>
 
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|}
 
  
 
== 40 nm Microprocessors ==
 
== 40 nm Microprocessors ==

Revision as of 05:05, 24 April 2016

basic wafer drawing.svg Semiconductor lithography processes technology
v · d · e

The 40 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 45 nm and 32 nm processes. Commercial integrated circuit manufacturing using 40 nm process began in 2008 by leading semiconductor companies such as TSMC. This technology superseded by commercial 32 nm process by 2010.

Industry

Fab
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
TSMC Samsung Toshiba / NEC Crolles2 Alliance
Value 65 nm Δ Value 65 nm Δ Value 65 nm Δ Value 65 nm Δ
162 nm  ?x 129 nm 0.65x 168 nm 0.67x 140 nm  ?x
 ? nm  ?x 117 nm 0.65x  ? nm  ?x  ? nm  ?x
0.242 µm2  ?x  ? µm2  ?x 0.195 µm2 0.33x 0.250 µm2  ?x

40 nm Microprocessors

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40 nm System on Chips

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