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Difference between revisions of "3 nm lithography process"

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Revision as of 13:37, 1 June 2017

The 3.5 nanometer (3.5 nm) or 35 Å lithography process is a full node semiconductor manufacturing process following the 5 nm process node. Commercial integrated circuit manufacturing using 3.5 nm process is set to begin sometimes around 2024 or 2025. The term "3.5 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch.

Industry

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3.5 nm Microprocessors

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3.5 nm Microarchitectures

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