Revision as of 16:35, 24 April 2016

Semiconductor lithography processes technology

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The 350 nm lithography process is a full node semiconductor manufacturing process following the 500 nm process node. Commercial integrated circuit manufacturing using 350 nm process began in late 1995. 350 nm was phased out and replaced by 250 nm in 1999.

Industry

Design Rules

350 nm Microprocessors

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350 nm Microarchitectures

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