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32 nm lithography process
Revision as of 19:42, 14 April 2016 by ChipIt (talk | contribs) (32 nm Microprocessors)

The 32 nm lithography process is a full node semiconductor manufacturing process following the 40 nm process stopgap. Commercial integrated circuit manufacturing using 32 nm process began in 2010. This technology was superseded by the 28 nm process (HN) / 22 nm process (FN) in 2012.

32 nm Microprocessors

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32 nm System on Chips

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32 nm Microarchitectures

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